Application of Cobalt Alloy L605 in Semiconductor Equipment Components

As semiconductor manufacturing processes advance to smaller nodes, higher material performance is required for critical components of etching equipment. Cobalt-based alloy L605 (Haynes 25), known for its exceptional high-temperature strength, fatigue resistance, and corrosion resistance, has become the preferred material for key components such as electrostatic chucks and gas distribution rings in semiconductor etching systems.

L605 alloy is a Co-Cr-W-Ni superalloy with a typical composition: Co balance, Cr 19-21%, W 14-16%, Ni 9-11%. This alloy exhibits exceptional strength and excellent oxidation resistance below 540°C, while also resisting corrosion from fluorine- and chlorine-containing gases.

In semiconductor etching processes, L605 alloy components offer the following advantages: 1 Low outgassing rate that prevents vacuum contamination; 2 High resistance to plasma erosion for extended service life; 3 Moderate coefficient of thermal expansion ensuring excellent dimensional stability; 4 Sub-micron precision achievable through precision machining.

Jiangsu HEA can supply L605 alloy wire in Φ0.1-8mm specifications to semiconductor equipment manufacturers for producing various precision components, meeting the demands of extreme operating conditions.